Photochemical Etched Lead Frame for Semiconductors

Product Details
Customization: Available
Material: Metal
Layers: Single
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Year of Establishment
2006-03-22
Management System Certification
ISO9001:2015, ISO14001:2015
  • Photochemical Etched Lead Frame for Semiconductors
  • Photochemical Etched Lead Frame for Semiconductors
  • Photochemical Etched Lead Frame for Semiconductors
  • Photochemical Etched Lead Frame for Semiconductors
  • Photochemical Etched Lead Frame for Semiconductors
  • Photochemical Etched Lead Frame for Semiconductors
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Basic Info.

Model NO.
Etched Lead Frame
Type
Filter Disc
Hole Shape
Round
Structure
Single Network
Name
Etching Lead Frame
Tolerance
+/-0.01mm
Smallest Open Hole
0.1mm
Artwork
Ai/Coreldraw/Pdf etc
Thickness
0.03mm-1.5mm
Size
1*1mm2 - 300*500mm2
Transport Package
as Required
Specification
Custom
Trademark
YanMing etching lead frame
Origin
Shenhzen, China
Production Capacity
200000PCS/Day

Packaging & Delivery

Package Size
6.00cm * 4.00cm * 0.10cm
Package Gross Weight
0.100kg

Product Description

Important factors for quotation:
In order to get the best price, please provide the following information for your items:
1, metarial and thickness
2, size
3, finish
4, quantity
5, rough drawing will be very helpful

Our advantages:
1, Short lead time, we are able to finish your sample and goods within your tight deadline.
2, Provide you etching metal parts with high precision, tight tolerance, for example, 0.1mm material, the tolerance can be 0.02mm.
3, Good price and service, quotation will be provided in 24 hours after getting your inquiry.

Advantages of Photo Etching:
1, Low tooling cost.
2, Can make thinner metals(T=0.04-1.0 mm).
3, High accuracy.
4, Various apertures, shapes and bar combinations.
5, Burr & Stress free manufacturing method.
6, Short lead time and high volum capability.
Product Name  Customized Precision Photo Etching Metal Part/Component
Material  Brass, stainless Steel, aluminum 
Size  According to your requirements
Thickness  Range from 0.04mm to 1.0mm
Technique  High precision etching 
Minimum Hole  1.2 times by the thickness
Minimum Space  As the thickness 
Feature  No burrs, no broken point, no plugging hole
Application  Fiber filter, machine parts or customized
Certification   ISO
Inspection  250 times magnifier

Photochemical Etched Lead Frame for Semiconductors
Photochemical Etched Lead Frame for Semiconductors
Photochemical Etched Lead Frame for Semiconductors

Photochemical Etched Lead Frame for Semiconductors
Photochemical Etched Lead Frame for Semiconductors
Photochemical Etched Lead Frame for Semiconductors



 

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